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Electrodeposition of Vanadium Oxide/Manganese Oxide Hybrid Thin Films on Nanostructured Aluminum Substrates

机译:纳米结构铝基板上电沉积氧化钒/氧化锰混合薄膜

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摘要

Electrodeposition of functional coatings on aluminum electrodes in aqueous solutions often is impeded by the corrosion of aluminum. In the present work it is demonstrated that electrodeposition of vanadium, oxide films on nanostructured aluminum substrates can be achieved in acidic electrolytes employing a novel strategy in which a thin interspacing layer of manganese oxide is first electrodeposited on aluminum microrod substrates. Such deposited films, which were studied using SEM, XPS, XRD, and surface enhances Raman scattering as well as chronopotentiometry, are shown to comprise a mixture of vanadium oxidation states (i.e. IV and V). As this all-electrochemical approach circumvents the problems associated with aluminum corrosion, the approach provides new possibilities for the electrochemical coating of nanostructured Al substrates with functional layers of metal oxides. The latter significantly facilitates the development of new procedures for the manufacturing of three-dimensional aluminum based electrodes for lithium ion microbatteries. (C) The Author(s) 2014. Published by ECS. All rights reserved.
机译:铝的腐蚀通常会阻碍水溶液中铝电极上功能涂层的电沉积。在本工作中,证明了采用一种新颖的策略在酸性电解质中可以在纳米结构的铝基板上实现钒氧化物膜的电沉积,在该策略中,首先在铝微棒基板上先沉积一层薄的氧化锰层。使用SEM,XPS,XRD和表面增强拉曼散射以及计时电位法研究的这种沉积膜显示出包含钒氧化态(即IV和V)的混合物。由于这种全电化学方法规避了与铝腐蚀有关的问题,因此该方法为用金属氧化物功能层对纳米结构Al基材进行电化学涂层提供了新的可能性。后者极大地促进了用于制造用于锂离子微电池的三维铝基电极的新程序的开发。 (C)作者2014。由ECS出版。版权所有。

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